CVD Material Processing. Effect of O2 on Formation of Ar-O2 RF Plasma.
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: KAGAKU KOGAKU RONBUNSHU
سال: 2000
ISSN: 0386-216X,1349-9203
DOI: 10.1252/kakoronbunshu.26.792